Explore sub-50nm fabrication using mechanical patterning techniques; overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography; wafer-scale and roll-to-roll nanopatterning with applications in electronics, photonics, and nanomedicine; physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput. Three lecture hours a week for one semester. Only one of the following may be counted: Electrical and Computer Engineering 340P, Electrical Engineering 340P, 379K (Topic: High Throughput Nanopatterning), Mechanical Engineering 379M (Topic: High Throughput Nanopatterning). Prerequisite: Electrical and Computer Engineering 411 (or Electrical Engineering 411) or 411H, and 339 (or Electrical Engineering 339), and Mathematics 427K or 427J, with a grade of at least C- in each.