E E 340P E E 340P. High-Throughput Nanopatterning. 3 Hours.
Sub-50nm fabrication using mechanical patterning techniques; overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography; wafer-scale and roll-to-roll nanopatterning with applications in electronics, photonics, and nanomedicine; physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput. Three lecture hours a week for one semester. Only one of the following may be counted: Electrical Engineering 340P, 379K (Topic: High-Throughput Nanopatterning), and Mechanical Engineering 379M (Topic: High-Throughput Nanopatterning). Prerequisite: Electrical Engineering 411 and 339, and Mathematics 427K or 429J, with a grade of at least C- in each.