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ECE 340P ECEĀ 340P. High-Throughput Nanopatterning. 3 Hours.

Explore sub-50nm fabrication using mechanical patterning techniques; overview of photolithography, mechanical nanopatterning processes, hot embossing, and UV imprint lithography; wafer-scale and roll-to-roll nanopatterning with applications in electronics, photonics, and nanomedicine; physics of nanoreplication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput. Three lecture hours a week for one semester. Only one of the following may be counted: Electrical and Computer Engineering 340P, Electrical Engineering 340P, 379K (Topic: High Throughput Nanopatterning), Mechanical Engineering 379M (Topic: High Throughput Nanopatterning). Prerequisite: Electrical and Computer Engineering 411 (or Electrical Engineering 411) and 339 (or Electrical Engineering 339), and Mathematics 427K or 429J, with a grade of at least C- in each.